Optimized cleaning method for producing device quality InP(100) surfaces
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1935745
Reference20 articles.
1. Atomic hydrogen cleaning of GaAs and InP surfaces studied by photoemission spectroscopy
2. Semiconductor substrate cleaning and surface morphology in molecular beam epitaxy
3. Atomic hydrogen cleaning of InP(100) for preparation of a negative electron affinity photocathode
4. Core and valence-level photoemission study of theInP(001)−(2×1)Ssurface: Surface structure and electronic states
5. Soft X-ray photoemission studies of
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