Abnormal grain growth in aluminum alloy thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.348452
Reference45 articles.
1. Aluminum metallization—Advantages and limitations for integrated circuit applications
2. Aluminum metallization—Advantages and limitations for integrated circuit applications
3. Evolution and Current Status of Aluminum Metallization
4. Electromigration Damage in Aluminum Film Conductors
5. Effect of texture and grain structure on electromigration in Al-0.5%Cu thin films
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