Intrinsic efficiency comparison in various low‐pressure XeF laser mixtures pumped at high excitation rates and with short‐pulse electron beam pumping
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.99618
Reference16 articles.
1. 354-nm laser action on XeF
2. The influence of diluent gas on the XeF laser
3. Kinetic processes of electron beam generated XeF* and Xe2F* excimers
4. XeF laser performance for F<inf>2</inf>and NF<inf>3</inf>fuels
5. Improved performance of XeF lasers in argon diluent
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3. Gas discharge lasers pumped by generators with semiconductor opening switch;International Conference on Lasers, Applications, and Technologies 2007: High-Power Lasers and Applications;2007-06-15
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