Ion density evolution in a high-power sputtering discharge with bipolar pulsing
Author:
Affiliation:
1. Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons, Belgium
2. Materia Nova Research Center, Parc Initialis, B-7000 Mons, Belgium
Funder
'Reforgas' Greenwin project
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5030697
Reference17 articles.
1. Magnetic Field Effects on an Abnormal Truncated Glow Discharge and Their Relation to Sputtered Thin‐Film Growth
2. High power impulse magnetron sputtering discharge
3. Ionized physical vapor deposition (IPVD): A review of technology and applications
4. Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges
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