The influence of Cu∕Al ratio on properties of chemical-vapor-deposition-grown p-type Cu–Al–O transparent semiconducting films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1997293
Reference20 articles.
1. Nanocrystalline p-type transparent Cu–Al–O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors
2. P-type electrical conduction in transparent thin films of CuAlO2
3. High-Conductivity p-Type Transparent Copper Aluminum Oxide Film Prepared by Plasma-Enhanced MOCVD
4. Effects of aluminum on the properties of p-type Cu–Al–O transparent oxide semiconductor prepared by reactive co-sputtering
5. Synthesis and characterization of p-type transparent conducting CuAlO2 thin film by DC sputtering
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