Dynamics of CO2laser heating in the processing of silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.91334
Reference9 articles.
1. Properties of laser‐assisted doping in silicon
2. Annealing of phosphorus‐ion‐implanted silicon using a CO2laser
3. Temperature rise induced by a laser beam
4. Temperature rise induced by a laser beam II. The nonlinear case
5. Heat treating and melting material with a scanning laser or electron beam
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