Characterization of neutral, positive, and negative species in a chlorine high-density surface-wave plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1538313
Reference25 articles.
1. Etching Characteristics and Mechanism of Ba0.7Sr0.3TiO3Thin Films in an Inductively Coupled Plasma
2. A simple optical emission method for measuring percent dissociations of feed gases in plasmas: Application to Cl2 in a high‐density helical resonator plasma
3. Percent dissociation of Cl2 in inductively coupled, chlorine-containing plasmas
4. Characterization of Cl2/Ar high density plasmas for semiconductor etching
5. Laser-induced fluorescence and Langmuir probe determination of Cl2+ and Cl+ absolute densities in transformer-coupled chlorine plasmas
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3. Investigation of nickel as hard mask for patterning multicomponent oxide materials in chlorine plasmas;Journal of Applied Physics;2013-09-14
4. Characterization of a low-pressure chlorine plasma column sustained by propagating surface waves using phase-sensitive microwave interferometry and trace-rare-gas optical emission spectroscopy;Journal of Applied Physics;2011-06
5. Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas;Pure and Applied Chemistry;2010-05-04
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