Lateral diffusion of Ni and Si through Ni2Si in Ni/Si couples
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.93635
Reference8 articles.
1. Aluminum alloy metallization for integrated circuits
2. Growth Kinetics Observed in the Formation of Metal Silicides on Silicon
3. Growth kinetics of planar binary diffusion couples: ’’Thin‐film case’’ versus ’’bulk cases’’
4. Phase diagrams and metal‐rich silicide formation
5. Growth rate and phase formation in the nickel-silicon couple
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