Surface plasma source to generate high‐brightness H− beams for ion projection lithographya)-Reference-Cited by-同舟云学术

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Surface plasma source to generate high‐brightness H− beams for ion projection lithographya)

Published:1996-04 Issue:4 Volume:67 Page:1614-1617
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Dudnikov V. G.,Derevyankin G. E.,Kovalevsky D. V.,Savkin V. Ya.,Sokolovsky E. A.,Guharay S. K.

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1146897

Reference9 articles.

1. Projection ion beam lithography

2. Novel electrostatic column for ion projection lithography

3. Ion projection lithography for vacuum microelectronics

4. Ion projection lithography machine IPLM-01: A new tool for sub-0.5-micron modification of materials

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1. Surface Plasma Negative Ion Sources;Springer Series on Atomic, Optical, and Plasma Physics;2023

2. Development and Applications of Negative Ion Sources;Springer Series on Atomic, Optical, and Plasma Physics;2019

3. Surface Plasma Negative Ion Sources;Springer Series on Atomic, Optical, and Plasma Physics;2019

4. Negative hydrogen ion production mechanisms;Applied Physics Reviews;2015-06

5. Absolute beam brightness detector;Review of Scientific Instruments;2012-02

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