Growth of Ti3SiC2 thin films by elemental target magnetron sputtering-Reference-Cited by-同舟云学术

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Growth of Ti3SiC2 thin films by elemental target magnetron sputtering

Published:2004-11 Issue:9 Volume:96 Page:4817-4826
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Emmerlich Jens,Högberg Hans,Sasvári Szilvia,Persson Per O. Å.,Hultman Lars,Palmquist Jens-Petter,Jansson Ulf,Molina-Aldareguia Jon M.,Czigány Zsolt

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1790571

Reference29 articles.

1. Kink formation around indents in laminated Ti3SiC2 thin films studied in the nanoscale

2. The MN+1AXN phases: A new class of solids

3. Ti3SiC2—A layered ceramic exhibiting ultra-low friction

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