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Effects of applied voltage on hologram writing in lithium niobate

  • Published:1976-04 Issue:4 Volume:47 Page:1479-1484
  • ISSN:0021-8979
  • Container-title:Journal of Applied Physics
  • language:en
  • Short-container-title:

Author:

Cornish W. D.1,Moharam M. G.1,Young L.1

Affiliation:

1. Department of Electrical Engineering, The University of British Columbia, Vancouver, Canada

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference26 articles.

1. F. S. Chen, J. T. Lamacchia, and D. B. Fraser, Appl. Phys. Lett. 13, 223 (1968).APPLAB0003-6951

2. F. S. Chen, J. Appl. Phys. 40, 3389 (1969).JAPIAU0021-8979

3. J. J. Amodei and D. L. Staebler, RCA Rev. 33, 71 (1972).RCARCI0033-6831

4. W. Phillips, J. J. Amodei, and D. L. Staebler, RCA Rev. 33, 94 (1972).RCARCI0033-6831

5. F. Shah, T. A. Rabson, F. K. Tittel, and T. K. Gaylord, Appl. Phys. Lett. 24, 130 (1974).APPLAB0003-6951

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1. Formation of an Electric-Field Grating During Holographic Recording in PRCs;Photorefractive Crystals in Coherent Optical Systems;1991

2. Space charge field limitations in photorefractive LiNbO3:Fe crystals;Applied Physics B Photophysics and Laser Chemistry;1990-11

3. Effect of applied electric field on the buildup and decay of photorefractive gratings;IEEE Journal of Quantum Electronics;1986-10

4. Optical measurement of the photorefractive parameters of Bi12SiO20;Journal of Applied Physics;1985-07

5. Degenerate forward four-wave mixing in LiNbO3;Ferroelectrics Letters Section;1983-08
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