Avalanche‐Induced Negative Resistance in Thin Oxide Films-Reference-Cited by-同舟云学术

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Avalanche‐Induced Negative Resistance in Thin Oxide Films

Published:1965-01 Issue:1 Volume:36 Page:184-187
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:

Author:

Chopra K. L.¹

Affiliation:

1. Ledgemont Laboratory, Kennecott Copper Corporation, Lexington, Massachusetts

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference21 articles.

1. J. C. Fisher and I. Giaever, J. Appl. Phys. 32, 72 (1961).JAPIAU0021-8979

2. C. A. Mead, J. Appl. Phys. 32, 646 (1961).JAPIAU0021-8979

3. C. A. Mead, Phys. Rev. 128, 2088 (1962).PHRVAO0031-899X

4. P. R. Emtage and L. Tantraporn, Phys. Rev. Letters 8, 267 (1962).PRLTAO0031-9007

5. G. T. Advani, J. S. Gottling, and M. S. Osman, Proc. IRE 50, 1530 (1962).PIREAE0096-8390

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