Relation of Rate and Duration of Evaporation to Background Pressure for the Deposition of Thin Films in Vacuum-Reference-Cited by-同舟云学术

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Relation of Rate and Duration of Evaporation to Background Pressure for the Deposition of Thin Films in Vacuum

Published:1963-07 Issue:7 Volume:34 Page:2053-2056
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Schwarz Helmut

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1729734

Reference9 articles.

1. The Structure of Extremely Thin Layers Evaporated in Kinetic Vacuum Systems

2. Effect of Residual Gases on the Properties of Indium Films

3. Erratum: Methods of Obtaining High Vacuum by Ionization. Construction of an ``Electronic Pump''

4. Erratum: Methods of Obtaining High Vacuum by Ionization. Construction of an ``Electronic Pump''

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A new lead alloy for Josephson junctions;IEEE Transactions on Magnetics;1981-01

2. Thin-film laser detectors;Journal of Physics D: Applied Physics;1978-04-21

3. Response of Hepatic Endoplasmic Reticulum to Drugs and Chemicals;The Bulletin of the Society of Pharmacological and Environmental Pathologists;1976-12

4. Chemical Etch Rate Studies on Sputtered Chromium Films;Journal of The Electrochemical Society;1972

5. Preparation and Properties of Chromium Films;Journal of Applied Physics;1968-05

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