Photochemical vapor deposition of amorphous silica films using disilane and perfluorosilanes: Defect structures and deposition mechanism
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.341330
Reference22 articles.
1. Direct photochemical deposition of SiO2from the Si2H6+O2system
2. Low-Temperature Growth of Silicon Dioxide Film by Photo-Chemical Vapor Deposition
3. UV Irradiation Effects on Chemical Vapor Deposition of SiO2
4. Low Temperature Growth of SiO2Thin Film by Double-Excitation Photo-CVD
5. Effect of surface irradiation, substrate temperature, and annealing on laser deposited silicon dioxide
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3. Direct deposition of silica films using silicon alkoxide solution;Journal of Non-Crystalline Solids;1998-11
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