Mechanical properties of Xe-ion-irradiated high-entropy-alloy-based multilayers

Author:

G. Rao Smita1ORCID,Shu Rui1ORCID,Wang Ji2,Chai Jianlong3ORCID,Zhu Yabin3ORCID,le Febvrier Arnaud1ORCID,Eklund Per1ORCID

Affiliation:

1. Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University 1 , Linköping 58183, Sweden

2. School of Physical Science and Technology, Ningbo University 2 , Ningbo 315211, China

3. Institute of Modern Physics, Chinese Academy of Sciences 3 , Lanzhou 730000, China

Abstract

In this Letter, we investigate the mechanical stability of HEA-based multilayers after Xe-ion irradiation. CrFeCoNi/TiNbZrTa metallic and nitride thin films with a bilayer thickness of 30 nm were grown by reactive dc-magnetron sputtering on Al2O3(0001) substrates for irradiation studies and on Si(100) substrates for other characterizations. The films were subjected to 3-MeV Xe-ion irradiation at room temperature (RT) and at 500 °C. The crystal structure and mechanical properties of the films before and after irradiation were studied by x-ray diffraction and nanoindentation. Before irradiation, both the metallic and nitride multilayers displayed a lower hardness (7 and 20 GPa, respectively). Annealing at 500 °C for 150 min increased the hardness of the multilayer samples, but it also induced intermixing of elements between the sublayers of the metallic multilayer. Irradiation hardening was observed only in the metallic multilayer at room temperature. When comparing the effects of irradiation damage vs the effects of annealing on the mechanical properties, it was observed that annealing the multilayers had a more pronounced effect.

Funder

VINNOVA

SFO-Mat LiU

Knut och Alice Wallenbergs Stiftelse

Vetenskapsrådet

Swedish Foundation for Strategic Research

Natural Science Fund of Zhejiang Province

State Key Laboratory of Haier Group Digital Home Appliances

Publisher

AIP Publishing

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