Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction
Author:
Affiliation:
1. Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Funder
Japan Society for the Promotion of Science (JSPS)
Japan Science and Technology Agency (JST)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4932647
Reference39 articles.
1. Nanoscale Magnification and Shape Control System for Precision Overlay in Jet and Flash Imprint Lithography
2. Reduction of pattern peeling in step-and-flash imprint lithography
3. Self-aligned metallization on organic semiconductor through 3D dual-layer thermal nanoimprint
4. Eco-friendly, water-repellent, light-transparent film derived from psicose using nanoimprint lithography
5. Developing novel liquid crystal technologies for display and photonic applications
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