Techniques for improving the Si–SiO2interface characterization

Author:

Sher A.,Hoffman H. J.,Su Pin,Tsuo Y. H.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. A comprehensive study on the interface states in the ECR-PECVD SiO2/p-Si MOS structures analyzed by different method;Physica E: Low-dimensional Systems and Nanostructures;2019-05

2. Impurities and Defects;Device Physics of Narrow Gap Semiconductors;2009-08-28

3. Properties of MIS structures prepared on InGaAsSb quaternary solutions by anodic oxidation;Solid-State Electronics;1994-10

4. Electrical properties of GaSb Schottky diodes and p-n junctions;Materials Science and Engineering: B;1992-02

5. The effect of hydrogen on bulk and surface traps in indium antimonide;Solid State Communications;1990-05

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