Symmetry plays a key role in the erasing of patterned surface features
Author:
Affiliation:
1. Laboratoire de Physico-Chimie Théorique, UMR CNRS Gulliver 7083, ESPCI ParisTech, PSL Research University, 75005 Paris, France
2. Department of Physics and Astronomy, McMaster University, Hamilton, Ontario L8S 4M1, Canada
Funder
Natural Sciences and Engineering Research Council of Canada (Conseil de Recherches en Sciences Naturelles et en Génie du Canada)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4927599
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5. Controlling Order in Block Copolymer Thin Films for Nanopatterning Applications
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