Excellent surface passivation of germanium by a-Si:H/Al2O3 stacks-Reference-Cited by-同舟云学术

Excellent surface passivation of germanium by a-Si:H/Al2O3 stacks

Published:2021-10-07 Issue:13 Volume:130 Page:135303
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Berghuis Wilhelmus J. H. (Willem-Jan)¹^ORCID,Melskens Jimmy¹^ORCID,Macco Bart¹^ORCID,Theeuwes Roel J.¹^ORCID,Black Lachlan E.²^ORCID,Verheijen Marcel A.¹³^ORCID,Kessels Wilhelmus M. M. (Erwin)¹^ORCID

Affiliation:

1. Department of Applied Physics, EindhovenUniversity of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands

2. Research School of Electrical, Energy and Materials Engineering, The Australian National University, Canberra, ACT 2600, Australia

3. Eurofins Materials Science BV, High Tech Campus 11, 5656 AE Eindhoven, The Netherlands

Funder

The Netherlands Organization for Scientific Research

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0064808

Reference101 articles.

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