Electron transport, ionization, and attachment coefficients in C2F4 and C2F4/Ar mixtures
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1368385
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1. Highly Selective Contact Hole Etching Using Electron Cyclotron Resonance Plasma
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