Ellipsometric Technique for Obtaining Substrate Optical Constants
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1658424
Reference17 articles.
1. Determination of the Properties of Films on Silicon by the Method of Ellipsometry
2. Ellipsometric investigations of oxide films on Ga As
3. USE OF AN ELLIPSOMETER TO DETERMINE SURFACE CLEANLINESS AND MEASUREMENT OF THE OPTICAL AND DIELECTRIC CONSTANTS OF InSb AT λ = 5461 Å
4. Effect of a Thin Surface Film on the Ellipsometric Determination of Optical Constants*
5. Ellipsometric Method for the Determination of All the Optical Parameters of the System of an Isotropic Nonabsorbing Film on an Isotropic Absorbing Substrate Optical Constants of Silicon*
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