Stabilization of C‐49 Ti(AlxSi1−x)2observed from the reaction between TiSi2and Al
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.108350
Reference8 articles.
1. Variations in interface compound nucleation for Ti‐Al ultrathin films on Si substrates
2. Investigation of the Al/TiSi2/Si contact system
3. Thermal stability of Al–Si/TiSi2/Si Schottky diodes
4. The microstructure and electrical properties of contacts formed in the Ti/Al/Si system due to rapid thermal processing
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Microstructure and properties of dense Tyranno-ZMI SiC/SiC containing Ti3Si(Al)C-2 with plastic deformation toughening mechanism;J EUR CERAM SOC;2018
2. C49/C54 phase transformation during chemical vapor deposition of TiSi2;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-01
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