Monitoring and modeling silicon homoepitaxy breakdown with real-time spectroscopic ellipsometry
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1903110
Reference20 articles.
1. The future of crystalline silicon films on foreign substrates
2. Low-temperature epitaxial growth of Si by electron cyclotron resonance chemical vapor deposition
3. Hot-wire chemical vapor deposition for epitaxial silicon growth on large-grained polycrystalline silicon templates
4. Limiting thickness h_{epi} for epitaxial growth and room-temperature Si growth on Si(100)
5. Growth of epitaxial silicon at low temperatures using hot-wire chemical vapor deposition
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