An improved multi-exposure approach for high quality holographic femtosecond laser patterning-Reference-Cited by-同舟云学术

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An improved multi-exposure approach for high quality holographic femtosecond laser patterning

Published:2014-12 Issue:22 Volume:105 Page:221104
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Zhang Chenchu¹,Hu Yanlei¹,Li Jiawen¹^ORCID,Lao Zhaoxin¹,Ni Jincheng¹,Chu Jiaru¹,Huang Wenhao¹,Wu Dong¹

Affiliation:

1. Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026, China

Funder

National Basic Research Program of China

The Fundamental Research Funds for the Central Universities

National Natural Science Foundation of China (NSFC)

Natural Science Foundation of Anhui Province (Anhui Provincial Natural Science Foundation)

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4902925

Reference20 articles.

1. Dynamic generation of Debye diffraction-limited multifocal arrays for direct laser printing nanofabrication

2. Two-photon polymerization of a three dimensional structure using beams with orbital angular momentum

3. Simultaneous additive and subtractive three-dimensional nanofabrication using integrated two-photon polymerization and multiphoton ablation

4. Two-photon laser precision microfabrication and its applications to micro-nano devices and systems

5. Femtosecond laser microfabrication of periodic structures using a microlens array

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