Nitrogen plasma instabilities and the growth of silicon nitride by electron cyclotron resonance microwave plasma chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.363943
Reference25 articles.
1. Microwave Plasma Etching
2. Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma
3. The performance of a microwave ion source immersed in a multicusp static magnetic field
4. Low‐energy ion extraction with small dispersion from an electron cyclotron resonance microwave plasma stream
5. Hydrogen Concentration and Bond Configurations in Silicon Nitride Films Prepared by ECR Plasma CVD Method
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