Record high electron mobility and low sheet resistance on scaled-channel N-polar GaN/AlN heterostructures grown on on-axis N-polar GaN substrates by plasma-assisted molecular beam epitaxy

Author:

Diez Sandra1ORCID,Mohanty Subhajit2ORCID,Kurdak Cagliyan13ORCID,Ahmadi Elaheh12ORCID

Affiliation:

1. Applied Physics Program, University of Michigan, Ann Arbor, Michigan 48109, USA

2. Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109, USA

3. Department of Physics, University of Michigan, Ann Arbor, Michigan 48109, USA

Funder

Office of Naval Research

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Reference28 articles.

1. B. Romanczyk , S. Wienecke , M. Guidry , H. Li , K. Hestroffer , E. Ahmadi , X. Zheng , S. Keller , and U. K. Mishra , in 2016 74th Annual Device Research Conference ( IEEE, 2016), pp. 1–2.

2. A. Arias , P. Rowell , J. Bergman , M. Urteaga , K. Shinohara , X. Zheng , H. Li , B. Romanczyk , M. Guidry , S. Wienecke , E. Ahmadi , S. Keller , and U. Mishra , in 2017 IEEE Compound Semiconductor Integrated Circuits Symposium (CSICS) ( Institute of Electrical and Electronics Engineers, Inc. 2017), pp. 1–3.

3. Analysis of MOCVD SiNx Passivated N-Polar GaN MIS-HEMTs on Sapphire With High $f_{max}\cdot V_{DS,Q}$

4. W-Band Power Performance of SiN-Passivated N-Polar GaN Deep Recess HEMTs

5. N-Polar GaN HEMTs Exhibiting Record Breakdown Voltage Over 2000 V and Low Dynamic On-Resistance

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