Influence of sputtering pressure on the properties of hydrogenated amorphous‐silicon carbon alloy films prepared by magnetron sputtering of silicon in methane‐argon gas mixtures
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.336995
Reference21 articles.
1. Highly photoconductive and photosensitive hydrogenated amorphous silicon carbon alloy films prepared by magnetron sputtering
2. Structural, optical and electronic properties of amorphous SiC: H alloys prepared by magnetron sputtering of silicon in methane-argon gas mixtures
3. Photoluminescence and optical properties of plasma-deposited amorphous Si x C1–x alloys
4. Electronic and optical properties of glow-discharge amorphous silicon-carbon alloys
5. Electronic and optical properties of glow-discharge amorphous silicon-carbon alloys
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1. Correlation between the stress in ZnO thin films and the Urbach band tail width;physica status solidi (c);2008-08
2. Indium doping of amorphous SiC:H films prepared by reactive magnetron co-sputtering;Thin Solid Films;1999-09
3. Chemical (dis)order in a-Si1−xCx:H for x<0.6;Physical Review B;1997-02-15
4. Electrical and optical properties of phosphorus-doped a-SiC:H thin films;Materials Chemistry and Physics;1997-01
5. Bonding structure and optical bandgap of rf sputtered hydrogenated amorphous silicon carbide alloy films;Journal of Non-Crystalline Solids;1994-06
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