Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering
Author:
Affiliation:
1. Solid State Electronics, The Ångström Laboratory, Uppsala University, P.O. Box 534, SE-75121 Uppsala, Sweden
Funder
Stiftelsen för Strategisk Forskning (SSF)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4977814
Reference45 articles.
1. High power impulse magnetron sputtering discharge
2. An introduction to thin film processing using high-power impulse magnetron sputtering
3. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)
4. A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering
5. Titanium oxide thin films deposited by high-power impulse magnetron sputtering
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