Synchrotron radiation stimulated semiconductor processes: Chemical vapor deposition and etching
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1140807
Reference5 articles.
1. Synchrotron radiation‐excited chemical vapor deposition of SixNyHzfilm
2. Synchrotron radiation-excited chemical-vapor deposition and etching
3. Synchrotron radiation‐induced etching of a carbon film in an oxygen gas
4. Synchrotron Radiation-Assisted Etching of Silicon Surface
5. The reaction of fluorine atoms with silicon
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2. Chemistry Induced by Core Electron Excitation;Advances in Chemical Physics;2007-03-14
3. Synchrotron radiation stimulated etching of SiO2 thin films;Acta Physica Sinica;2006
4. Giant Vesicle Fusion on Microelectrodes Fabricated by Femtosecond Laser Ablation Followed by Synchrotron Radiation Etching;Japanese Journal of Applied Physics;2005-09-09
5. Synchrotron radiation induced Si–H dissociation on H–Si(111)–1×1 surfaces studied by in situ monitoring in the undulator-scanning tunneling microscope system;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2005-09
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