Investigation of the photochemistry of the poly{p-phenylenevinylene} precursor system: Implications for nanolithography
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2727477
Reference21 articles.
1. Lithography in UV photoresist using NSOM
2. Near-field optical lithography of a conjugated polymer
3. Near-field optical patterning and structuring based on local-field enhancement at the extremity of a metal tip
4. Optical properties of highly oriented poly(p-phenylene-vinylene)
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Real poly(p-phenylene vinylene) features from near-field scanning optical lithography and the implications for further modelling;Journal of Physics D: Applied Physics;2015-07-10
2. Fabricating semi-conducting polymer photonic structures via near-field scanning optical lithography;Synthetic Metals;2009-03
3. The origin of fine structure in near-field scanning optical lithography of an electroactive polymer;Journal of Physics D: Applied Physics;2008-09-19
4. Erratum: Investigation of the photochemistry of the poly {p-phenylenevinylene} precursor system: Implications for nanolithography [J. Chem. Phys. 126, 174703 (2007)];The Journal of Chemical Physics;2008-01-28
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