Theoretical process for the investigation of dielectric characteristics of F3NO as an alternative gas for SF6

Author:

Chang Hyonu1ORCID,Sinha Nidhi1ORCID,Choi Heechol1,Song Mi-Young1ORCID,Jang Hyun-Jae2ORCID,Oh Yeon-Ho2,Song Ki-Dong2

Affiliation:

1. Institute of Plasma Technology, Korea Institute of Fusion Energy 1 , 37 Dongjangsan-ro, Gunsan City, Jeollabuk-do 54004, Republic of Korea

2. Advanced Power Apparatus Research Center, Korea Electrotechnology Research Institute 2 , 12 Jeongiui-gil, Seongsan-gu, Changwon, Gyeongsangnam-do 51543, Republic of Korea

Abstract

To examine the possibility of using a gas molecule as an SF6 alternative gas, the insulation properties of the molecule must be estimated. In this work, we present a theoretical approach to calculate geometry parameters, electron scattering cross sections, and transport properties of nitrogen fluoride oxide (F3NO), which we have selected as an alternative to SF6. The molecular minimum structure of F3NO was optimized using the ɷB97X-D functional combined with the aug-cc-pVTZ basis set. Using this initial geometry obtained by the molecular structure calculation, the R-matrix calculation was done to obtain the elastic and momentum transfer cross section. The BE-f method was used for electronic excitation cross section. For the ionization cross section, the binary encounter Bethe method was used. From the calculated cross section data, the electron transport coefficients and reaction coefficients were calculated by solving the two-term approximated Boltzmann equation to investigate the discharge and insulation characteristics.

Funder

National Fusion Research Institute

National Research Council of Science and Technology

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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