High aspect ratio submicron silicon pillars fabricated by photoassisted electrochemical etching and oxidation-Reference-Cited by-同舟云学术

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High aspect ratio submicron silicon pillars fabricated by photoassisted electrochemical etching and oxidation

Published:1995-09-25 Issue:13 Volume:67 Page:1877-1879
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Lau H. W.,Parker G. J.,Greef R.,Hölling M.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.114362

Reference7 articles.

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