Structural study of diamond film formed on silicon wafer by hot‐filament chemical vapor deposition method
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.112413
Reference15 articles.
1. Epitaxial growth of diamond on diamond substrate by plasma assisted CVD
2. Epitaxial growth of diamond thin films on cubic boron nitride {111} surfaces by dc plasma chemical vapor deposition
3. Oriented cubic nucleations and local epitaxy during diamond growth on silicon {100} substrates
4. The effect of substrate bias voltage on the nucleation of diamond crystals in a microwave plasma assisted chemical vapor deposition process
5. Effects of surface pretreatments on nucleation and growth of diamond films on a variety of substrates
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