Direct CVD growth of MoS2 on chemically and thermally reduced graphene oxide nanosheets for improved photoresponse
Author:
Affiliation:
1. Key Laboratory of Flexible Electronics (KLOFE) and Institute of Advanced Materials (IAM), Nanjing Tech University (Nanjing Tech), 30 South Puzhu Road, Nanjing 211816, People’s Republic of China
Publisher
AIP Publishing
Subject
General Engineering,General Materials Science
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0047015
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