X rays in electron‐cyclotron‐resonance processing plasmas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.106846
Reference9 articles.
1. Vacuum ultraviolet radiation damage in electron cyclotron resonance and reactive ion etch plasmas
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4. Polarization of the Free-Free Bremsstrahlung in an Anisotropic Hot-Electron Plasma
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1. Ultrasoft x-ray emission from a linear ECR plasma source;Plasma Sources Science and Technology;2004-03-12
2. Degradation measurements using fully processed test transistors in high density plasma reactors for failure analysis;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11
3. A Review of SiC Reactive Ion Etching in Fluorinated Plasmas;physica status solidi (b);1997-07
4. Electron Cyclotron Resonance Plasma Sources;High Density Plasma Sources;1995
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