1. W. Tsai, L. Ragnarsson, P. J. Chen, B. Onsia, R. J. Carter, E. Cartier, E. Young, M. Green, M. Caymax, S. De Gendt, and M. Heyns, Proc. Dig. Papers, Symp. VLSI Technol., 2003, pp. 3A–3.
2. S. Inumiya, K. Sekine, S. Niwa, A. Kaneko, M. Sato, T. Watanabe, H. Fukui, Y. Kamata, M. Koyama, A. Nishiyama, M. Takayanagi, K. Eguchi, and Y. Tsunashima, VLSI Tech. Sym. Dig., 2003, pp. 17–18.
3. Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone