Influence of the applied field frequency (27–2450 MHz) in high‐frequency sustained plasmas used to etch polyimide
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.99872
Reference11 articles.
1. Decapsulation and Photoresist Stripping in Oxygen Microwave Plasmas
2. Comparison of microwave and lower frequency plasmas for thin film deposition and etching
3. Characteristics of high-frequency and direct-current argon discharges at low pressures: a comparative analysis
4. The waveguide surfatron: a high power surface-wave launcher to sustain large-diameter dense plasma columns
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1. Microwave discharges at low pressures and peculiarities of the processes in strongly non-uniform plasma;Plasma Sources Science and Technology;2015-08-20
2. Travelling-wave-sustained discharges;Physics Reports;2007-05
3. Gas heating in low-pressure microwave argon discharges;Physical Review E;2002-12-03
4. Gas temperature equation in a high-frequency argon plasma column at low pressures;Physics of Plasmas;2002-01
5. The Development and Use of Surface-Wave Sustained Discharges for Applications;Advanced Technologies Based on Wave and Beam Generated Plasmas;1999
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