Picosecond gain and saturation measurements of the 353‐nm XeF laser line-Reference-Cited by-同舟云学术

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Picosecond gain and saturation measurements of the 353‐nm XeF laser line

Published:1977-12 Issue:11 Volume:31 Page:747-749
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Tomov I. V.,Fedosejevs R.,Richardson M. C.,Sarjeant W. J.,Alcock A. J.,Leopold K. E.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.89525

Reference10 articles.

1. Picosecond XeF amplified laser pulses

2. 354-nm laser action on XeF

3. Electron‐beam‐controlled discharge pumping of the XeF laser

4. XeF* (C1/2) radiative lifetime measurement

5. Radiative lifetime of the C state of XeF

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photoabsorption and photoassociation into the XeF(B) excimer state;Chemical Physics Letters;1996-08

2. Photodissociation XeF laser operating in the visible and UV regions;Journal of Russian Laser Research;1995-09

3. High-brightness ultraviolet excimer lasers;Applied Physics B Laser and Optics;1994-03

4. High power ultrafast excimer lasers;Journal of Applied Physics;1991-01

5. Gain dynamics of XeF and subpicosecond pulse generation at 351 nm;Applied Physics B Photophysics and Laser Chemistry;1988-12

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