Forming silicon carbon nitride crystals and silicon carbon nitride nanotubes by microwave plasma-enhanced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1487925
Reference27 articles.
1. Prediction of New Low Compressibility Solids
2. Characteristics of Si$z.sbnd;C$z.sbnd;N films deposited by microwave plasma CVD on Si wafers with various buffer layer materials
3. Effects of Substrate Pretreatments and Catalyst Applications on Si–C–N Films and Nanotube Formations
4. Properties of Si–C–N films prepared on Si substrate using cobalt interfacial layers
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