Epitaxial growth of high quality WO3 thin films
Author:
Affiliation:
1. Brookhaven National Laboratory, Upton, New York 11973, USA
2. Jožef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia
3. Applied Physics Department, Yale University, New Haven, Connecticut 06520, USA
Funder
US Department of Energy
Publisher
AIP Publishing
Subject
General Engineering,General Materials Science
Link
http://scitation.aip.org/deliver/fulltext/aip/journal/aplmater/3/9/1.4930214.pdf?itemId=/content/aip/journal/aplmater/3/9/10.1063/1.4930214&mimeType=pdf&containerItemId=content/aip/journal/aplmater
Reference34 articles.
1. Electrochromic materials and devices: present and future
2. Highly Crystalline WO 3 Thin Films with Ordered 3D Mesoporosity and Improved Electrochromic Performance
3. Electrochromic Materials
4. Electrochromic Devices Based on Porous Tungsten Oxide Thin Films
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