Electron beam-induced carbon masking for electrodeposition on semiconductor surfaces
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1371243
Reference18 articles.
1. Direct nanometer scale patterning of SiO2with electron beam irradiation through a sacrificial layer
2. Nanometer scale pattern replication using electron beam direct patterned SiO2as the etching mask
3. A Novel Method for Fabrication of Ultrafine Metal Lines by Electron Beams
4. Direct nanometer scale patterning of SiO2 with electron-beam irradiation
5. 10‐nm linewidth electron beam lithography on GaAs
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