On the selection of Morris trajectories for parametric sensitivity analysis in spectroscopic ellipsometry modeling

Abstract

Spectroscopic ellipsometry and some other optical metrology techniques, such as reflectometry and scatterometry, are model-based optical measurements and, therefore, require appropriate modeling to determine the geometric and material properties of substrates, thin films, and multilayer structures. Parametric sensitivity analysis (SA) provides essential assistance in the model-building process to quantify the relative importance of model parameters for model output and to identify those with high/little influence. SA can be performed in a variety of ways, and this article discusses an application of the Morris or elementary effect (EE) method, a screening type SA procedure, to spectroscopic ellipsometry modeling. The method is a global SA technique and uses a stepping of m parameters along certain so-called “trajectories” or sequences of points in parameter space, randomly constructed in order to maximally fill the volume of the m-dimensional parameter space. However, it was thought that the EE method relies greatly on a sampling strategy or a way of selecting “optimized trajectories” in the parameter space, i.e., a necessary number of trajectories chosen to be well spread over the space to properly cover the entire realistic ranges of all input factors. Here, we use two sampling methods for selecting trajectories with possibly different distributions and investigate their effects on the estimation of various sensitivity measures in spectroscopic ellipsometry data modeling. The SA results indicate that the performance of the sampling strategy should not be judged only by maximizing the trajectory spread but also include some additional convergence criteria for the sensitivity measures.