A concept of “materials” diffraction and imaging beamline for SKIF: Siberian circular photon source

Author:

Chernov Vladimir A.1,Bataev Ivan A.2ORCID,Rakshun Yakov V.13ORCID,Khomyakov Yuri V.14ORCID,Gorbachev Maksim V.2ORCID,Trebushinin Andrei E.1ORCID,Chkhalo Nikolay I.5ORCID,Krasnorutskiy Dmitry A.2ORCID,Naumkin Viktor S.26ORCID,Sklyarov Artem N.4ORCID,Mezentsev Nikolay A.1,Korsunsky Alexander M.7ORCID,Dolbnya Igor P.8ORCID

Affiliation:

1. Budker Institute of Nuclear Physics 1 , 11 Acad. Lavrentyev Av., Novosibirsk 630090, Russian Federation

2. Novosibirsk State Technical University 2 , 20 Karl Marks Av., Novosibirsk 630073, Russian Federation

3. Siberian State University of Telecommunications and Information Science 3 , 86 Kirova Str., Novosibirsk 630102, Russian Federation

4. Novosibirsk State University 4 , 1 Pirogova Str., Novosibirsk 630090, Russian Federation

5. Institute for Physics of Microstructures 5 , Nizhny Novgorod 607680, Russian Federation

6. Kutateladze Institute of Thermophysics 6 , 1 Acad. Lavrentyev Av., Novosibirsk 630090, Russian Federation

7. Department of Engineering Science, University of Oxford 7 , Oxford OX1 3PJ, United Kingdom

8. Diamond Light Source, Harwell Science and Innovation Campus 8 , Didcot, Oxfordshire OX11 0DE, United Kingdom

Abstract

Over the next decade, the extremely brilliant fourth generation synchrotron radiation sources are set to become a key driving force in materials characterization and technology development. In this study, we present a conceptual design of a versatile “Materia” diffraction and imaging beamline for a low-emittance synchrotron radiation facility. The beamline was optimized for operation with three main principal delivery regimes: parallel collimated beam ∼1 mm beam size, micro-focus regime with ∼10 μm beam spot size on the sample, and nano-focus regime with <100 nm focus. All regimes will operate in the photon energy range of 10–30 keV with the key feature of the beamline being fast switching between them, as well as between the various realizations of diffraction and imaging operation modes while maintaining the target beam position at the sample, and with both spectrally narrow and spectrally broad beams up to the energy band ΔE/E of 5 × 10−2. The manuscript presents the details of the principal characteristics selected for the insertion device and beamline optics, the materials characterization techniques, including the simulations of thermal load impact on the critical beamline optics components. Significant efforts were made to design the monochromators to mitigate the very high beam power load produced by a superconducting undulator source. The manuscript will be of interest to research groups involved in the design of new synchrotron beamlines.

Publisher

AIP Publishing

Subject

Instrumentation

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