Realignment of As doped polycrystalline Si films by double step annealing
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.105935
Reference14 articles.
1. Resistivity and Carrier Mobilities in Heavily Doped Polycrystalline Silicon Thin Films
2. Electrical Characterization of Polysilicon-to-Silicon Interfaces
3. Structure and morphology of polycrystalline silicon‐single crystal silicon interfaces
4. Physics, technology, and modeling of polysilicon emitter contacts for VLSI bipolar transistors
5. Emitter resistance of arsenic- and phosphorus-doped polysilicon emitter transistors
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Epitaxial regrowth of n+ polycrystalline silicon at 850 °C, induced by fluorine implantation;Applied Physics Letters;1995-04-10
2. Phosphorus segregation at polysilicon-silicon interfaces from in situ P spike-doped silicon films;Semiconductor Science and Technology;1995-03-01
3. Interface evolution and epitaxial realignment in polycrystal/single crystal Si structures;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1994-03
4. Role of grain boundaries in the epitaxial realignment of undoped and As-doped polycrystalline silicon films;Journal of Materials Research;1993-10
5. Structural and electrical study of epitaxially realigned Sb-doped polycrystalline Si films;Materials Science and Engineering: B;1993-04
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