Enhanced negative ion formation in ultraviolet‐laser irradiated silane: Implications for plasma deposition of amorphous silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.112642
Reference13 articles.
1. Time‐resolved measurements of highly polymerized negative ions in radio frequency silane plasma deposition experiments
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3. Measurement of the ionisation and attachment coefficients in monosilane and disilane
4. Detection of Negative Ions in a Helium-Silane RF Plasma
5. Detection of Negative Ions in a Helium-Silane RF Plasma
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