Using focused ion beam damage patterns to photoelectrochemically etch features in III‐V materials
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96735
Reference6 articles.
1. Photoelectrochemical etching of integral lenses on InGaAsP/InP light‐emitting diodes
2. The Photoelectrochemical Oxidation of (100), (111), and (1̅1̅1̅) n ‐ InP and n ‐ GaAs
3. Holographic photoelectrochemical etching of diffraction gratings inn‐InP andn‐GaInAsP for distributed feedback lasers
4. Hole transport equation analysis of photoelectrochemical etching resolution
5. Integrated circuit repair using focused ion beam milling
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1. Nanoscale effects in carbon structures fabricated using focused ion beam-chemical vapor deposition;Thin Solid Films;2010-07
2. Gas-assisted focused electron beam and ion beam processing and fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008
3. Cathodoluminescence microscopy and spectroscopy of GaN epilayers microstructured using surface charge lithography;Journal of Applied Physics;2006-07-15
4. Nanoscale patterning by focused ion beam enhanced etching for optoelectronic device fabrication;Microelectronic Engineering;2001-09
5. Photoelectrochemical etching of semiconductors;IBM Journal of Research and Development;1998-09
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