Novelinsitupattern etching of GaAs by electron‐beam‐stimulated oxidation and subsequent Cl2gas etching
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.348626
Reference16 articles.
1. Scattering Suppression and High-Mobility Effect of Size-Quantized Electrons in Ultrafine Semiconductor Wire Structures
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4. FIB-Assisted Cl 2 Gas Etching of GaAs
5. Insitupattern formation and high quality overgrowth by gas source molecular beam epitaxy
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3. Electron-stimulated oxidation of Al(111) by oxygen at low temperatures: Mechanism of enhanced oxidation kinetics;Physical Review B;2002-04-24
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