Monte Carlo simulations of argon ion transport in the downstream region of electron cyclotron resonance plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.367323
Reference31 articles.
1. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
2. Characteristics of electron cyclotron resonance plasma sources
3. Reactive ion stream etching utilizing electron cyclotron resonance plasma
4. Tungsten etching using an electron cyclotron resonance plasma
5. Electron cyclotron resonance plasma reactor for SiO2 etching: Process diagnostics, end‐point detection, and surface characterization
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