Third-order optical nonlinearity in silicon nitride films prepared using magnetron sputtering and application for optical bistability-Reference-Cited by-同舟云学术

Third-order optical nonlinearity in silicon nitride films prepared using magnetron sputtering and application for optical bistability

Published:2019-03-21 Issue:11 Volume:125 Page:113102
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Ding Baoyong¹,Yu Xiuru¹,Lu Heng²,Xiu Xianwu¹,Zhang Chao¹,Yang Cheng¹,Jiang Shouzhen¹,Man Baoyuan¹^ORCID,Ning Tingyin¹,Huo Yanyan¹

Affiliation:

1. Shandong Provincial Key Laboratory of Optics and Photonic Devices, School of Physics and Electronics, Shandong Normal University, Jinan 250014, China

2. Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

Funder

National Natural Science Foundation of China

China Postdoctoral Science Foundation

Natural Science Foundation of Shandong Province

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5085234

Reference46 articles.

1. Nonlinear silicon photonics

2. New CMOS-compatible platforms based on silicon nitride and Hydex for nonlinear optics

3. Si-rich SiNx based Kerr switch enables optical data conversion up to 12 Gbit/s

4. Broad-band continuous-wave parametric wavelength conversion in silicon nanowaveguides

5. CMOS-compatible multiple-wavelength oscillator for on-chip optical interconnects

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