Experimental identification of defect-induced destructive breakdown of AlGaN ultraviolet avalanche photodiodes

Author:

Yang Fan12ORCID,Yang Fucheng13,Xu Jintong1ORCID,Li Xiangyang1ORCID

Affiliation:

1. Shanghai Institute of Technical Physics, Chinese Academy of Sciences 1 , Shanghai 200083, People’s Republic of China

2. University of Chinese Academy of Sciences 2 , Beijing 100049, People’s Republic of China

3. University of Shanghai for Science and Technology 3 , Shanghai 200093, People’s Republic of China

Abstract

The issue of destructive breakdown and high dark current in AlGaN ultraviolet avalanche photodiodes has conventionally been attributed to material defects, yet direct evidence supporting this claim has been absent. Examining damaged devices that experienced destructive breakdown revealed an intriguing finding: post-treatment with a potent alkali resulted in the emergence of corrosion pits on the device’s surface. Subsequently, a dry etching process was implemented in the targeted area to eliminate the corrosion pit. Remarkably, the current–voltage measurement subsequent to this treatment showcased a complete restoration of the damaged device’s previous performance. This unequivocally indicates that the destructive breakdown was localized, and the point of punch-through could be precisely identified through the corrosion pit. Consequently, it is now firmly believed that material defects constitute the primary cause of destructive breakdown in these instances.

Funder

National Key Research and Development Program of China

Publisher

AIP Publishing

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